Processing equipment

For 20 years, NT-MDT Co. specialized in design and manufacture of equipment for both standard and customized applications.

To date we offer processing stations for operations that are most frequent and important in microelectronics, namely:

• Plasma chemical ething system ETNA-100-PT that provides cleaning samples and etching and removing masks of resist material
• Magnetron deposition system  ETNA-100-MT that provides depositing a wide variety of thin films (conductive, dielectric, multilayered multicomponent semiconducting, nitrides, and oxides) onto substrates of diameters up to 100 mm