NANOFAB 100 platform: UHV cluster for nanolocal techniques

Ultra-high vacuum cluster for local techniques

This cluster contains:

 

• UHV SPM module - UHV scanning probe microscopy module
• UHV FIB module - FIB nanolocal treatment UHV module 
• FIB Imp module - UHV FIB implantation module
• RDC module - UHV radial distribution module
• LS module - Module for sample loading and storage
• RT module - UHV module for sample revolution and transportation 
   

This cluster allows using focused ion beams in the conditions of high vacuum, which provides the highest level of clearness of the structures fabricated.

The presence of a UHV SPM provides control of the structures fabricated with sub-nanometer resolution.

• Cluster overall dimensions - 300х470 cm.

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